A formula for the central potential’s maximum magnitude in arbitrarily doped symmetric double-gate MOSFETs

نویسندگان

  • Francisco J. García-Sánchez
  • Adelmo Ortiz-Conde
چکیده

0038-1101/$ see front matter 2012 Elsevier Ltd. A http://dx.doi.org/10.1016/j.sse.2012.05.001 ⇑ Corresponding author. E-mail addresses: [email protected], [email protected] (F We propose here a simple approximate, yet accurate, formula to easily calculate the maximum magnitude of the electric potential at the channel width’s midpoint of symmetric Double Gate (DG) MOSFETs with any arbitrary body doping concentration. According to it this maximummagnitude depends only on the body’s thickness and doping concentration, apart from its usual dependence on quasi-Fermi level splitting. The new formula allows to easily determine the critical body thickness value above which any arbitrarily doped symmetric DG MOSFET can be satisfactorily modeled using a conventional bulk MOSFET model. This critical value depends only on body doping concentration, The proposed approximate formula also constitutes a useful means to quickly calculate initial values in iterative numerical calculations of doped symmetric DG MOSFET models. 2012 Elsevier Ltd. All rights reserved.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Drain Current Models for Single-Gate Mosfets & Undoped Symmetric & Asymmetric Double-Gate SOI Mosfets And Quantum Mechanical Effects: A Review

In this paper modeling framework for single gate conventional planar MOSFET and double gate (DG) MOSFETS are reviewed. MOS Modeling can be done by either analytical modeling or compact modeling. Single gate MOSFET technology has been the choice of mainstream digital circuits for VLSI as well as for other high frequency application in the low GHZ range. The major single gate MOS modeling methods...

متن کامل

A Carrier Based Compact Model for Long Channel Undoped and Doped Body Symmetric Double Gate MOSFETS

Double gate MOSFET is widely used for sub-50nm technology of transistor design .They have immunity to short channel effects, reduced leakage current and high scaling potential. The single gate Silicon–on-insulator (SOI) devices give improved circuit speed and power consumption .But as the transistor size is reduced the close proximity between source and drain reduces the ability of the gate ele...

متن کامل

Generic Compact Model Development of Double-Gate MOSFETs with Inclusion of Different Operation Modes and Channels from Heavily Doped to Intrinsic Case

In this paper, the Double-Gate MOSFET’s operation modes such as symmetric, asymmetric and independent-gate-operation are discussed and an idea for the generic compact model development is proposed. It is shown that the presented generic model predicts different DG MOSEET operation modes and the characteristics, which are well verified by the 2-D numerical simulator in different cases. We also a...

متن کامل

A Diamond:H/MoO3 MOSFET

A p-type MOSFET based on a heterointerface of hydrogenated-diamond transfer doped with MoO3 (Diamond:H/MoO3) is demonstrated for the first time. This is an important new heterostructure system due to its potentially improved temperature stability as compared with the better established Diamond:H/H2O system. MOSFETs using HfO2 as gate insulator show excellent output characteristics and gate cont...

متن کامل

Simulation of Asymmetric Doped High Performance Soi- Mosfets for Vlsi Cmos Technologies

Asymmetric halo and extension implantations are examined by simulation for their usability in 45 nm and 32 nm-technology high performance SOI-MOSFETs. Tilted implantations from the source side show higher saturation currents and lower drain overlap capacitances, which improve the intrinsic MOSFET power delay product. Furthermore the asymmetry leads to an inverter chain speed benefit. The strong...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2012